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Message: Updated Patent: Optoelectronic Integrated Circuit

(oups deleted my message by accident)

Unfortunately I don't have time to look into it, it's been a busy week for me. Had to come here to check the share price, hehe.


Initial thoughts though, is that this is the 2nd time this patent has been updated. If you look here:http://patents.justia.com/assignee/opel-solar-inc , they have 3 patents with the same name. So I'm assuming they're expansions/additions of very core processes in the POET design.

Patent number: 9082637
Abstract: A semiconductor device includes a substrate supporting a plurality of layers that include at least one modulation doped quantum well (QW) structure offset from a quantum dot in quantum well (QD-in-QW) structure. The modulation doped QW structure includes a charge sheet spaced from at least one QW by a spacer layer. The QD-in-QW structure has QDs embedded in one or more QWs. The QD-in-QW structure can include at least one template/emission substructure pair separated by a barrier layer, the template substructure having smaller size QDs than the emission substructure. A plurality of QD-in-QW structures can be provided to support the processing (emission, absorption, amplification) of electromagnetic radiation of different characteristic wavelengths (such as optical wavelengths in range from 1300 nm to 1550 nm).
Type: Grant
Filed: June 19, 2013
Issued: July 14, 2015
Assignees: THE UNIVERSITY OF CONNECTICUT, OPEL SOLAR, INC.

Inventor: Geoff W. Taylor


Application number: 20150214425
Abstract: A semiconductor device employs an epitaxial layer arrangement including a first ohmic contact layer and first modulation doped quantum well structure disposed above the first ohmic contact layer. The first ohmic contact layer has a first doping type, and the first modulation doped quantum well structure has a modulation doped layer of a second doping type. At least one isolation ion implant region is provided that extends through the first ohmic contact layer. The at least one isolation ion implant region can include oxygen ions. The at least one isolation ion implant region can define a region that is substantially free of charge carriers in order to reduce a characteristic capacitance of the device. A variety of high performance transistor devices (e.g., HFET and BICFETs) and optoelectronic devices can employ this device structure. Other aspects of wavelength-tunable microresonantors and related semiconductor fabrication methodologies are also described and claimed.
Type: Application
Filed: March 24, 2014
Issued: July 30, 2015
Assignees: Opel Solar, Inc., The University of Connecticut

Inventor: Geoff W. Taylor


Application number: 20150144872
Abstract: A semiconductor device includes a substrate supporting a plurality of layers that include at least one modulation doped quantum well (QW) structure offset from a quantum dot in quantum well (QD-in-QW) structure. The modulation doped QW structure includes a charge sheet spaced from at least one QW by a spacer layer. The QD-in-QW structure has QDs embedded in one or more QWs. The QD-in-QW structure can include at least one template/emission substructure pair separated by a barrier layer, the template substructure having smaller size QDs than the emission substructure. A plurality of QD-in-QW structures can be provided to support the processing (emission, absorption, amplification) of electromagnetic radiation of different characteristic wavelengths (such as optical wavelengths in range from 1300 nm to 1550 nm).
Type: Application
Filed: November 20, 2014
Issued: May 28, 2015
Assignees: Opel Solar, Inc., The University of Connecticut

Inventor: Geoff W. Taylor

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