In a surprising move, Intel is quietly in the process of acquiring IMS Nanofabrication, a developer of multi-beam e-beam tools for mask writing applications, Semiconductor Engineering has learned.

With the deal, Intel is moving into uncharted territory by buying a semiconductor equipment company. In the past, though, the chip giant has invested in equipment vendors, such as ASML, Nikon and others.

Intel also views multi-beam mask writing as a critical part of the mask infrastructure. “Intel is completing its acquisition of IMS Nanofabrication, a leader in multi-beam mask writing technology based in Vienna, Austria,” according to a statement from Intel. “The technology IMS Nanofabrication is developing, multi-beam mask writing (MBMW), makes it possible to pattern finer features at high speed to enable cost-effective, advanced lithography.

“The current plan is for IMS Nanofabrication to operate as a standalone subsidiary of Intel – continuing their collaborative efforts and supporting their other industry customers,” according to Intel.

Intel, Photronics and others were early investors in IMS. In addition, Intel, DNP, Photronics and TSMC are collaborating on an effort to accelerate IMS’ multi-beam tool in the market.

IMS is also working with JEOL to develop the industry’s first multi-beam mask writers in the market. In addition, NuFlare is also developing a multi-beam e-beam system.

http://semiengineering.com/the-week-in-review-manufacturing-103/