Re: Required yield, and capacity...
in response to
by
posted on
Apr 08, 2020 12:32PM
As I mentioned some time ago Vivek commented that it can be debated whether patents are actually required. That is driven by the fact that anyone attempting to copy would have a very difficult time to get it right. First off the dielectric stack has taken a long time to develop and consists of many layers with a lot of variations within each layer to achieve the required properties. So both the materials and how they are deposited would require a great deal of R&D to duplicate and that would just be a first step. Ultimately the barrier to entry are the trade secrets and knowhow.
I think they fully expect to have the OI platform in high volume production long before anyone could potentially replicate the design. Then after all the work to attempt to replicate what happens when the large companies who buy from POET or license the tech? They retaliate.
So if someone wants it all to themselves there really is no alternative than for them to buy the company.